Estudo de deposição de filmes finos em plasmas de Ar/Ar-H2 em regiões de pós-descarga de catodo oco

Abstract

Plasma DC hollow cathode has been used for the deposition of thin films by sputtering with release of neutral atoms from the cathode. Hollow-cathode plasma of Ar-H2 currently used in the industry has proven to be more efficient in cleaning surfaces and thin film deposition when compared to argon plasma. When we wish to avoid the effects of ion bombardment of the substrate using discharge to post-discharge region. Were generated by discharge plasma of argon and hydrogen in hollow cathode deposition of thin films of titanium on glass substrate. The optical emission spectroscopy was used for diagnosis in post-discharge and the films formed were analyzed using the technique of mechanical profilometry. A variation in the rate of deposition of titanium on the glass substrate for different process parameters, the deposition time, the discharge distance, and working gases. There was an increase in the relative intensity of the species of argon with the introduction of hydrogen gas.