The effect of pulse width on the microstructure of d.c.-plasma-nitrided layers

Alves Júnior, Clodomiro; Rodrigues, José de Anchieta; Martinelli, Antonio Eduardo

The effect of pulse width on the microstructure of d.c.-plasma-nitrided layers

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dc.contributor.author	Alves Júnior, Clodomiro
dc.contributor.author	Rodrigues, José de Anchieta
dc.contributor.author	Martinelli, Antonio Eduardo
dc.date.accessioned	2021-02-10T20:33:15Z
dc.date.available	2021-02-10T20:33:15Z
dc.date.issued	1999-12-15
dc.description.resumo	Modern ion nitriding equipment are powered by pulsed sources in order to prevent arcing and overheating. In industrial applications, the pulse frequency is usually adjusted to set the working temperature. However, frequency variations may drastically affect the plasma species population, and consequently, the microstructure of the final nitrided layer. In this study, AISI-409 steel was nitrided in a mixture of 20% N2–80% H2 using a d.c power source. The depth and microstructure of the nitrided layer were assessed as a function of the time that the voltage was off, toff, in the range of 1–4 ms during a 10 ms pulse cycle. The results suggested that both the microstructure and mechanical behavior of the nitrided layer were affected by toff. Long toff values imply a deleterious effect on the mechanical properties of the nitrided layers	pt_BR
dc.identifier.citation	ALVES, C; RODRIGUES, J.A; MARTINELLI, A.E. The effect of pulse width on the microstructure of d.c.-plasma-nitrided layers. Surface And Coatings Technology, [S.L.], v. 122, n. 2-3, p. 112-117, dez. 1999. Disponível em: https://www.sciencedirect.com/science/article/abs/pii/S0257897299003266?via%3Dihub. Acesso em: 26 nov. 2020. http://dx.doi.org/10.1016/s0257-8972(99)00326-6.	pt_BR
dc.identifier.doi	10.1016/S0257-8972(99)00326-6
dc.identifier.issn	0257-8972
dc.identifier.uri	https://repositorio.ufrn.br/handle/123456789/31472
dc.language	en	pt_BR
dc.publisher	Elsevier	pt_BR
dc.rights	Attribution 3.0 Brazil	*
dc.rights.uri	http://creativecommons.org/licenses/by/3.0/br/	*
dc.subject	Ion bombardment	pt_BR
dc.subject	Pulsed plasma	pt_BR
dc.subject	Plasma nitriding	pt_BR
dc.title	The effect of pulse width on the microstructure of d.c.-plasma-nitrided layers	pt_BR
dc.type	article	pt_BR