Obtenção de filmes finos de cobre por gaiola catódica em vidro e tecido analisando o jato interno e externo variando a espessura da tampa e os parâmetros de deposição

Abstract

The deposition of thin films by plasma improves various physical, chemical and biological properties of surfaces that contribute to the ennoblement of the materials. The objective of this work is to study the deposition kinetics of thin films of copper on glass and fabric substrates using the cathodic cage technique, changing the thickness of the cage lid and its relation with the variation of the power of the treatment. Owing to the high temperature inside the cage, the tissue samples were fixed to the upper flange of the reactor, and the glass was positioned both inside and outside the cage, thus analyzing the deposition of the internal jet and external the cathodic cage. Copper thin films are characterized as good electrical and thermal conductors, which justify their use in microelectronics, and according to the U.S. Environmental Agency (EPA) there are 282 types of bactericidal copper alloys, enabling their use in sterile environments. Thus, depositions of thin films of copper were carried out on glass, polyamide and polyester samples, varying the process parameters and the thickness of the cage lid. The characterization was performed by X-ray diffraction (XRD), X-Ray Fluorescence Spectroscopy (FRX), Field-Scanning Scanning Electron Microscopy (SEM) with Microanalysis by Dispersive Energy Spectroscopy (EDS), Transmittance and Spectroscopy of X-Ray Excited Photoelectrons (XPS). The results showed that, after treatment, all samples, both glass and fabric, obtained copper in their structure, that is, it was possible to perform deposition on the substrates regardless of the location of the same, relative to the cage. However, the internal samples obtained a higher rate of deposition.