Navegando por Autor "Machulek Júnior, Amilcar"

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Advanced oxidation processes and their application in the petroleum industry: a review
(Brazilian Journal of Petroleum and Gas, 2008) Chiavone Filho, Osvaldo; Mota, André Luis Novais; Albuquerque, Liana Filgueira; Beltrame, Leocádia Terezinha Cordeiro; Machulek Júnior, Amilcar; Nascimento, Cláudio Augusto Oller do
Advanced oxidation processes (AOP) are technologies based on the generation of highly reactive species, the hydroxyl radicals, used in oxidative degradation procedures for organic compounds dissolved or dispersed in aquatic media. These processes are promising alternatives for decontamination of media containing dissolved recalcitrant organic substances, which would not be efficiently removed by conventional methods. The present paper describes a series of AOP, analyzing the aspects related to each type of process, such as the interference of external agents and the ideal operating conditions, based on the analysis and comparison of different studies in the area. In addition, several applied AOP studies on treatment of oil wastewater and on remediation of soil contaminated with oil or its derivatives are presented
Photo-Fenton oxidation of phenol and organochlorides (2,4-DCP and 2,4-D) in aqueous alkaline medium with high chloride concentration
(Elsevier, 2012-11-30) Chiavone Filho, Osvaldo; Luna, Airton José de; Machulek Júnior, Amilcar; Nascimento, Cláudio Augusto Oller do; Moraes, José Ermírio Ferreira de
A highly concentrated aqueous saline-containing solution of phenol, 2,4-dichlorophenoxyacetic acid (2,4-D) and 2,4-dichlorophenol (2,4-DCP) was treated by the photo-Fenton process in a system composed of an annular reactor with a quartz immersion well and a medium-pressure mercury lamp (450 W). The study was conducted under special conditions to minimize the costs of acidification and neutralization, which are usual steps in this type of process. Photochemical reactions were carried out to investigate the influence of some process variables such as the initial concentration of Fe2+ ([Fe2+]0) from 1.0 up to 2.5 mM, the rate in mmol of H2O2 fed into the system () from 3.67 up to 7.33 mmol of H2O2/min during 120 min of reaction time, and the initial pH (pH0) from 3.0 up to 9.0 in the presence and absence of NaCl (60.0 g/L). Although the optimum pH for the photo-Fenton process is about 3.0, this particular system performed well in experimental conditions starting at alkaline and neutral pH. The results obtained here are promising for industrial applications, particularly in view of the high concentration of chloride, a known hydroxyl radical scavenger and the main oxidant present in photo-Fenton processes

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Navegando por Autor "Machulek Júnior, Amilcar"